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JPEG Image - 34.0 KB - MD5: 3955ffaa752b535bfa591a4ca52c4c0e
Data
Fig. 3. Cross-sectional images of ATO thin films deposited over the course of (a) 10, (b) 20, and (c) 30 min
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Data
Fig. 4. AFM images of ATO thin films deposited over the course of (a) 10, (b) 20, and (c) 30 min
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Data
XRD data from ATO thin films synthesized with three different deposition times
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Data
Table 2. The electrical and optical parameters of ATO thin films
Nov 20, 2018
Arini, Tri; Lalasari, Latifa Hanum; Yuwono, Akhmad Herman; Firdiyono, F.; Andriyah, Lia; Subhan, Achmad, 2018, "Pengaruh Waktu Deposisi dan Temperatur Substrat terhadap Pembuatan Kaca Konduktif FTO (Fluorine-doped Tin Oxide)", https://hdl.handle.net/20.500.12690/RIN/WXRDJS, RIN Dataverse, V2
Pembuatan FTO (flourine-doped tin oxide) ini diharapkan dapat menggantikan fungsi ITO (indium tin oxide) karena proses pembuatan yang sederhana dan biaya yang relatif rendah. Prekursor timah klorida dengan doping flourine yang dipreparasi melalui metode sol-gel dengan proses pela...
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Data
Gambar 1. Hasil foto SEM lapisan tipis FTO dengan variasi waktu deposisi pada rasio doping 6% berat, temperatur 300 °C selama; (a) 5 menit; (b) 20 menit; (c) 30 menit; (d) 40 menit
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Data
Gambar 4. Hasil foto SEM lapisan tipis FTO dengan variasi waktu deposisi pada rasio doping 6 %berat, dengan waktu deposisi 5 menit pada temperatur (°C); (a) 250; (b) 300; (c) 350; dan (d) 400
JPEG Image - 33.4 KB - MD5: f9c8cf1536e55f481baad48189e8efd2
Data
Tabel 1. Analisis semikuantitatif EDS-SEM lapisan tipis kaca konduktif pada temperatur 300 °C dengan variasi waktu deposisi
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Data
Tabel 2. Pengaruh waktu deposisi pada rasio doping 6 %berat, temperatur 300 °C dengan variasi waktu (menit)
JPEG Image - 40.4 KB - MD5: de55739ce22c599d1983dde3fa6f18bc
Data
Tabel 3. Analisis semikuantitatif EDS-SEM lapisan tipis kaca konduktif dengan variasi waktu deposisi pada rasio doping 6 %berat, dengan waktu deposisi 5 menit dan variasi temperatur (°C)
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